发明授权
- 专利标题： Thermally developable materials with abrasion-resistant backside coatings
- 专利标题（中）： 具有耐磨背面涂层的耐热可开发材料
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申请号： US11194819申请日： 2005-08-01
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公开(公告)号： US07153636B1公开(公告)日： 2006-12-26
- 发明人: Thomas J. Ludemann , Gary E. LaBelle , Roland J. Koestner , Thomas J. Kub , Karissa L. Eckert
- 申请人： Thomas J. Ludemann , Gary E. LaBelle , Roland J. Koestner , Thomas J. Kub , Karissa L. Eckert
- 申请人地址： US NY Rochester
- 专利权人： Eastman Kodak Company
- 当前专利权人： Eastman Kodak Company
- 当前专利权人地址： US NY Rochester
- 代理商 J. Lanny Tucker; Louis M. Leichter
- 主分类号： G03C1/498
- IPC分类号： G03C1/498 ; G03C1/85 ; G03C1/89
摘要：
Thermally developable materials including photothermographic and thermographic materials have an outermost backside layer that includes a combination of a polysiloxane and a smectite clay that has been modified with a quaternary ammonium compound. The resulting outermost backside layers exhibit improved abrasion resistance. The materials can also include conductive layers underneath the outermost backside layer.