发明授权
- 专利标题: Method of manufacturing thin-film magnetic head
- 专利标题(中): 制造薄膜磁头的方法
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申请号: US11401955申请日: 2006-04-12
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公开(公告)号: US07155809B2公开(公告)日: 2007-01-02
- 发明人: Yoshitaka Sasaki , Hiroyuki Itoh , Takehiro Kamigama
- 申请人: Yoshitaka Sasaki , Hiroyuki Itoh , Takehiro Kamigama
- 申请人地址: US CA Milpitas HK Hong Kong
- 专利权人: Headway Technologies, Inc,SAE Magnetics (H.K.) Ltd.
- 当前专利权人: Headway Technologies, Inc,SAE Magnetics (H.K.) Ltd.
- 当前专利权人地址: US CA Milpitas HK Hong Kong
- 代理机构: Oliff & Berridge, PLC
- 主分类号: G11B5/127
- IPC分类号: G11B5/127 ; G11B5/147
摘要:
A method of manufacturing a thin-film magnetic head comprises the steps of forming a first pole layer, forming a gap layer on a pole portion of the first pole layer, and forming a second pole layer on the gap layer. The second pole layer incorporates a first layer adjacent to the gap layer, and a second layer including a track width defining portion. The step of forming the second pole layer includes the steps of: forming a magnetic layer for forming the first layer on the gap layer; forming the second layer on the magnetic layer; and etching the magnetic layer to align with a width of the track width defining portion, so that the magnetic layer is formed into the first layer and the width of each of the first layer and the second layer taken in a medium facing surface is made equal to the track width.
公开/授权文献
- US20060191129A1 Method of manufacturing thin-film magnetic head 公开/授权日:2006-08-31
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