Invention Grant
- Patent Title: Megasonic cleaning using supersaturated cleaning solution
- Patent Title (中): 超声波清洗使用过饱和清洗液
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Application No.: US10864929Application Date: 2004-06-10
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Publication No.: US07156111B2Publication Date: 2007-01-02
- Inventor: Cole S. Franklin , Yi Wu , Brian Fraser
- Applicant: Cole S. Franklin , Yi Wu , Brian Fraser
- Applicant Address: DE Wilmington
- Assignee: Akrion Technologies, Inc
- Current Assignee: Akrion Technologies, Inc
- Current Assignee Address: DE Wilmington
- Agency: Wolf, Block, Schorr & Solis-Cohen
- Agent Brian L. Belles
- Main IPC: B08B3/00
- IPC: B08B3/00

Abstract:
A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.
Public/Granted literature
- US20050161059A1 Megasonic cleaning using supersaturated cleaning solution Public/Granted day:2005-07-28
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