发明授权
- 专利标题： Using supercritical fluids to clean lenses and monitor defects
- 专利标题（中）： 使用超临界流体清洁镜头并监测缺陷
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申请号： US10978844申请日： 2004-11-01
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公开(公告)号： US07156925B1公开(公告)日： 2007-01-02
- 发明人: Ramkumar Subramanian , Bhanwar Singh , Khoi A. Phan , Srikanteswara Dakshina-Murthy
- 申请人： Ramkumar Subramanian , Bhanwar Singh , Khoi A. Phan , Srikanteswara Dakshina-Murthy
- 申请人地址： US CA Sunnyvale
- 专利权人： Advanced Micro Devices, Inc.
- 当前专利权人： Advanced Micro Devices, Inc.
- 当前专利权人地址： US CA Sunnyvale
- 代理机构： Amin, Turocy&Calvin LLP
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
Disclosed are immersion lithography methods involving irradiating a first photoresist through a lens and an immersion liquid, the immersion liquid contacting the lens and the first photoresist in a first apparatus; contacting the lens with a supercritical fluid in a second apparatus; and irradiating a second photoresist through the lens and an immersion liquid, the immersion liquid contacting the lens and the second photoresist in the first apparatus.
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