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US07163435B2 Real time monitoring of CMP pad conditioning process 失效
实时监测CMP垫调理过程

Real time monitoring of CMP pad conditioning process
摘要:
CMP pad conditioning processes have been monitored and controlled by detecting the vibrational spectrum of a sensor mounted on the conditioner support arm. An accelerometer is used as the detector so that vibrational velocity (which correlates with pad wear) can be measured, rather than displacement or acceleration. After the vibrational spectrum has been transformed to its frequency domain equivalent, it is monitored for the presence of abnormal peaks in order to control the conditioning process.
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