发明授权
- 专利标题: Method for making a field emission display
- 专利标题(中): 场发射显示方法
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申请号: US10810024申请日: 2004-03-26
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公开(公告)号: US07166009B2公开(公告)日: 2007-01-23
- 发明人: Zhaofu Hu , Pijin Chen , Liang Liu , Shou Shan Fan
- 申请人: Zhaofu Hu , Pijin Chen , Liang Liu , Shou Shan Fan
- 申请人地址: CN Beijing TW Tu-Cheng
- 专利权人: Tsinghua University,Hon Hai Precision Ind. Co., Ltd.
- 当前专利权人: Tsinghua University,Hon Hai Precision Ind. Co., Ltd.
- 当前专利权人地址: CN Beijing TW Tu-Cheng
- 代理商 Wei Te Chung
- 优先权: CN03114070 20030326
- 主分类号: H01J9/00
- IPC分类号: H01J9/00 ; H01J9/02 ; H01J9/40
摘要:
A method for making a field emission display includes the following steps: providing a substrate (11); forming cathode electrodes (21) on the substrate; forming carbon nanotubes (31) on the cathode electrodes; forming a barrier array (41); forming gate electrodes (51) on the barrier array; fixing the barrier array with the gate electrodes to the substrate; packaging a phosphor screen (71) with the substrate. The barrier array is formed by depositing an insulative layer (43) on a shadow mask which defines a plurality of openings (42) according to a pixel pattern of the field emission display. This method employs the known technology for making a shadow mask in the field of CRTs. In addition, the thickness and the material of the insulative layer can be determined according to the insulative performance required for the field emission display. In summary, the present invention provides a field emission display having a barrier array with high precision and low production costs.
公开/授权文献
- US20040189183A1 Method for making a field emission display 公开/授权日:2004-09-30
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