发明授权
US07169709B2 Laser etching method and apparatus therefor 失效
激光蚀刻方法及其设备

  • 专利标题: Laser etching method and apparatus therefor
  • 专利标题(中): 激光蚀刻方法及其设备
  • 申请号: US10943026
    申请日: 2004-09-17
  • 公开(公告)号: US07169709B2
    公开(公告)日: 2007-01-30
  • 发明人: Jun Koide
  • 申请人: Jun Koide
  • 申请人地址: JP Tokyo
  • 专利权人: Canon Kabushiki Kaisha
  • 当前专利权人: Canon Kabushiki Kaisha
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Fitzpatrick, Cella, Harper & Scinto
  • 优先权: JP11-339556 19991130; JP11-339557 19991130; JP11-339558 19991130; JP11-339559 19991130; JP11-339560 19991130
  • 主分类号: H01L21/302
  • IPC分类号: H01L21/302
Laser etching method and apparatus therefor
摘要:
The invention provides a laser etching method for optical ablation working by irradiating a work article formed of an inorganic material with a laser light from a laser oscillator capable of emitting in succession light pulses of a large energy density in space and time with a pulse radiation time not exceeding 1 picosecond, wherein, in laser etching of the work article formed of the inorganic material by irradiation thereof with the laser light from the laser oscillator with a predetermined pattern and with a predetermined energy density, there is utilized means for preventing deposition of a work by-product around the etching position.
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