发明授权
- 专利标题： Polymers, resist compositions and patterning process
- 专利标题（中）： 聚合物，抗蚀剂组合物和图案化工艺
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申请号： US11179606申请日： 2005-07-13
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公开(公告)号： US07169869B2公开(公告)日： 2007-01-30
- 发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
- 申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
- 申请人地址： JP Tokyo JP Kadoma JP Ube
- 专利权人： Shin-Etsu Chemical Co., Ltd.,Matsushita Electric Industrial Co., Ltd.,Central Glass Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.,Matsushita Electric Industrial Co., Ltd.,Central Glass Co., Ltd.
- 当前专利权人地址： JP Tokyo JP Kadoma JP Ube
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2002-233194 20020809
- 主分类号： C08F12/30
- IPC分类号： C08F12/30
摘要：
A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.
公开/授权文献
- US20050267275A1 Polymers, resist compositions and patterning process 公开/授权日：2005-12-01