发明授权
- 专利标题： Methods for improving positioning performance of electron beam lithography on magnetic wafers
- 专利标题（中）： 改善电子束光刻在磁晶片上的定位性能的方法
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申请号： US10845956申请日： 2004-05-14
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公开(公告)号： US07172786B2公开(公告)日： 2007-02-06
- 发明人: Alexander Adrian Girling Driskill-Smith , Hieu Lam , Kim Y. Lee
- 申请人： Alexander Adrian Girling Driskill-Smith , Hieu Lam , Kim Y. Lee
- 申请人地址： NL Amsterdam
- 专利权人： Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人： Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人地址： NL Amsterdam
- 代理机构： Lorimer Labs
- 代理商 D'Arcy H. Lorimer
- 主分类号： B05D5/12
- IPC分类号： B05D5/12
摘要：
The present invention discloses a method for the production of sub-micron structures on magnetic materials using electron beam lithography. A subtractive process is disclosed wherein a portion of a magnetic material layer is removed from the substrate using conventional lithography, and the remaining portion of the magnetic material layer is patterned by e-beam lithography. A additive process is also disclosed wherein a thin magnetic seed layer is deposited on the substrate, a portion of which is removed by conventional lithography and replaced with a non-magnetic conducting layer. The remaining portion of magnetic seed layer is patterned by e-beam lithography and the final magnetic structure produced by electroplating.