Invention Grant
- Patent Title: Ionizer and method for gas-cluster ion-beam formation
- Patent Title (中): 用于气体簇离子束形成的离子发生器和方法
-
Application No.: US11257524Application Date: 2005-10-25
-
Publication No.: US07173252B2Publication Date: 2007-02-06
- Inventor: Michael E. Mack
- Applicant: Michael E. Mack
- Applicant Address: US MA Billerica
- Assignee: Epion Corporation
- Current Assignee: Epion Corporation
- Current Assignee Address: US MA Billerica
- Agency: Burns & Levinson LLP
- Agent Jerry Cohen; David W. Gomes
- Main IPC: H01J27/02
- IPC: H01J27/02 ; H01J27/00 ; H01J49/00

Abstract:
An ionizer for forming a gas-cluster ion beam is disclosed including inlet and outlet ends partially defining an ionization region traversed by a gas-cluster jet and one or more plasma electron source(s) for providing electrons to the ionizing region for ionizing at least a portion of the gas-clusters to form a gas-cluster ion beam. One or more sets of substantially linear rod electrodes may be disposed substantially parallel to and in one or more corresponding partial, substantially cylindrical pattern(s) about the gas-cluster jet axis, wherein some sets are arranged in substantially concentric patterns with differing radii. In certain embodiments, the ionizer includes one or more substantially linear thermionic filaments disposed substantially parallel to the gas-cluster jet axis, heating means, electrical biasing means to judiciously bias sets of the linear rod electrodes with respect to the thermionic filaments to achieve electron repulsion.
Public/Granted literature
- US20060097185A1 Ionizer and method for gas-cluster ion-beam formation Public/Granted day:2006-05-11
Information query