- 专利标题: Lithographic apparatus, device manufacturing method and a substrate
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申请号: US10898674申请日: 2004-07-26
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公开(公告)号: US07175968B2公开(公告)日: 2007-02-13
- 发明人: Marcel Mathijs Theodore Marie Dierichs , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
- 申请人: Marcel Mathijs Theodore Marie Dierichs , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 优先权: EP03254723 20030728
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03F7/207 ; G03F7/11 ; G03F7/38
摘要:
A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.