Invention Grant
- Patent Title: Semiconductor production system
- Patent Title (中): 半导体生产系统
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Application No.: US11495637Application Date: 2006-07-31
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Publication No.: US07177718B2Publication Date: 2007-02-13
- Inventor: Hidemitsu Naya , Rikio Tomiyoshi
- Applicant: Hidemitsu Naya , Rikio Tomiyoshi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2003-196698 20030714
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
A semiconductor production system has storage devices for storage of all kinds of information including, but not limited to, the information concerning semiconductor design and information as to semiconductor manufacture along with information relating to semiconductor inspection processes, while representing as a class an instance added with meta data indicative of the role of the information in accordance with a logical expressive form. The system has a network for the storage device use, called the storage area network or “SAN”. The SAN is for interconnection between respective ones of the storage devices, semiconductor manufacturing apparatuses and a semiconductor inspection apparatus. The storage devices are seamlessly accessible from any one of the semiconductor manufacture apparatuses and the semiconductor inspection apparatus and also from a semiconductor design environment associated therewith.
Public/Granted literature
- US20060265099A1 Semiconductor production system Public/Granted day:2006-11-23
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