发明授权
- 专利标题: Exposure device
- 专利标题(中): 曝光装置
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申请号: US11385694申请日: 2006-03-22
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公开(公告)号: US07184125B2公开(公告)日: 2007-02-27
- 发明人: Norihisa Takada
- 申请人: Norihisa Takada
- 申请人地址: JP Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2003-83608 20030325
- 主分类号: G03B27/54
- IPC分类号: G03B27/54
摘要:
A light beam emitted from a light source passes through a spatial light modulation device, at which a plurality of unit elements for respectively modulating incident light beam are two-dimensionally arrayed, and a microlens array, at which a plurality of microlenses corresponding to the unit elements are arrayed, and is focused on an exposure surface. A four-part detector, which is structured by four diodes, is disposed on the exposure surface so as to correspond to four pixels which are present at one corner of the exposure area. Relative mispositioning between the spatial light modulation device and the microlens array generates a difference in respective detection signals of the four diodes. Thus, an offset between the spatial light modulation device and the microlenses can be detected. Positional adjustment of the microlens array is performed on the basis of a detected offset amount.
公开/授权文献
- US20060158635A1 Exposure device 公开/授权日:2006-07-20
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