Invention Grant
- Patent Title: Assembly for material deposition
- Patent Title (中): 装配材料沉积
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Application No.: US10954263Application Date: 2004-10-01
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Publication No.: US07185973B2Publication Date: 2007-03-06
- Inventor: Gary A. Gibson , Krzysztof Nauka , Chung Ching Yang
- Applicant: Gary A. Gibson , Krzysztof Nauka , Chung Ching Yang
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: B41J2/09
- IPC: B41J2/09 ; B41J2/02

Abstract:
An assembly for depositing material onto a substrate includes a reservoir containing the material. The reservoir also includes a nozzle through which the material is jetted and formed into droplets. The droplets travel through flight paths prior to deposition onto the substrate. The assembly includes a charging ring for inducing an electrical charge to one or more of the droplets and a plurality of deflection plates for controlling the flight paths of the droplets. In addition, the assembly also includes a droplet manipulating device configured to manipulate the droplets at least one of during the flight paths and after deposition of the droplets onto the substrate.
Public/Granted literature
- US20050093957A1 Assembly for material deposition Public/Granted day:2005-05-05
Information query
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