发明授权
- 专利标题: Assembly for material deposition
- 专利标题(中): 装配材料沉积
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申请号: US10954263申请日: 2004-10-01
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公开(公告)号: US07185973B2公开(公告)日: 2007-03-06
- 发明人: Gary A. Gibson , Krzysztof Nauka , Chung Ching Yang
- 申请人: Gary A. Gibson , Krzysztof Nauka , Chung Ching Yang
- 申请人地址: US TX Houston
- 专利权人: Hewlett-Packard Development Company, L.P.
- 当前专利权人: Hewlett-Packard Development Company, L.P.
- 当前专利权人地址: US TX Houston
- 主分类号: B41J2/09
- IPC分类号: B41J2/09 ; B41J2/02
摘要:
An assembly for depositing material onto a substrate includes a reservoir containing the material. The reservoir also includes a nozzle through which the material is jetted and formed into droplets. The droplets travel through flight paths prior to deposition onto the substrate. The assembly includes a charging ring for inducing an electrical charge to one or more of the droplets and a plurality of deflection plates for controlling the flight paths of the droplets. In addition, the assembly also includes a droplet manipulating device configured to manipulate the droplets at least one of during the flight paths and after deposition of the droplets onto the substrate.
公开/授权文献
- US20050093957A1 Assembly for material deposition 公开/授权日:2005-05-05
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