Invention Grant
US07186319B2 Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry
有权
多轨磁控管具有更均匀的沉积和减小的旋转不对称性
- Patent Title: Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry
- Patent Title (中): 多轨磁控管具有更均匀的沉积和减小的旋转不对称性
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Application No.: US11029641Application Date: 2005-01-05
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Publication No.: US07186319B2Publication Date: 2007-03-06
- Inventor: Hong S. Yang , Tza-Jing Gung , Jian-Xin Lei , Ted Guo
- Applicant: Hong S. Yang , Tza-Jing Gung , Jian-Xin Lei , Ted Guo
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Charles S. Guenzer
- Main IPC: C23C14/35
- IPC: C23C14/35

Abstract:
A multi-track magnetron having a convolute shape and asymmetric about the target center about which it rotates. A plasma track is formed as a closed loop between opposed inner and outer magnetic poles, preferably as two or three radially arranged and spirally shaped counter-propagating tracks with respect to the target center and preferably passing over the rotation axis. The pole shape may be optimized to produce a cumulative track length distribution conforming to the function L=arn. After several iterations of computerized optimization, the pole shape may be tested for sputtering uniformity with different distributions of magnets in the fabricated pole pieces. If the uniformity remains unsatisfactory, the design iteration is repeated with a different n value, different number of tracks, or different pole widths. The optimization reduces azimuthal sidewall asymmetry and improves radial deposition uniformity.
Public/Granted literature
- US20060144703A1 Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry Public/Granted day:2006-07-06
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