Invention Grant
- Patent Title: Alkaline developer for radiation sensitive compositions
- Patent Title (中): 用于辐射敏感组合物的碱性显影剂
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Application No.: US10956871Application Date: 2004-10-01
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Publication No.: US07186498B2Publication Date: 2007-03-06
- Inventor: Willi-Kurt Gries , Marc Van Damme , Pascal Meeus , Mario Boxhorn
- Applicant: Willi-Kurt Gries , Marc Van Damme , Pascal Meeus , Mario Boxhorn
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: EP03103643 20031002
- Main IPC: G03F7/32
- IPC: G03F7/32

Abstract:
The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water and at least one inorganic salt having an alkaline reaction, wherein the developer has a pH of at least 11 and comprises at least three structurally different surfactants of formulae (A), (B) and (C), characterised in that the surfactant of formula (A) has one anionic group, the surfactant of formula (B) has two anionic groups, the surfactant of formula (C) is non-ionic and has at least one non-ionic hydrophilic group, and the concentration of each of the surfactants of formulae (A), (B) and (C) in the developer is at least 0.05 weight-% based on the total weight of the developer. The developer leads to less depositions and has a superior stability when used.
Public/Granted literature
- US20050106510A1 Alkaline developer for radiation sensitive compositions Public/Granted day:2005-05-19
Information query
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