发明授权
- 专利标题: Exposure head with spatial light modulator
- 专利标题(中): 曝光头与空间光调制器
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申请号: US10898233申请日: 2004-07-26
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公开(公告)号: US07187399B2公开(公告)日: 2007-03-06
- 发明人: Masaru Noguchi , Hiromi Ishikawa
- 申请人: Masaru Noguchi , Hiromi Ishikawa
- 申请人地址: JP Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2003-204404 20030731
- 主分类号: B41J15/14
- IPC分类号: B41J15/14 ; B41J27/00
摘要:
In an exposure head of the invention, plural first micro-focusing elements are arranged in a first microlens array so as to correspond to plural micromirrors in a DMD. An aperture array that includes plural apertures arranged so as to respectively correspond to the plural first micro-focusing elements is disposed. The apertures allow only main portions of Fraunhofer diffraction images to be transmitted therethrough. The main portions of the Fraunhofer diffraction images transmitted through the apertures are imaged on an exposure plane by second micro-focusing elements of a second microlens array. According to the exposure head of the invention, cross-talk light and scattered light can be effectively reduced, and beam diameters of beam spots projected on the exposure plane through the apertures can be adjusted to a required size.
公开/授权文献
- US20050024477A1 Exposure head 公开/授权日:2005-02-03
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