发明授权
- 专利标题： Mask used for layer formation and process of making the mask
- 专利标题（中）： 用于层的形成和制作掩模的过程的掩模
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申请号： US10750975申请日： 2004-01-05
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公开(公告)号： US07189480B2公开(公告)日： 2007-03-13
- 发明人: Takashi Chuman , Yoshihiko Uchida , Hideo Satoh , Takuya Hata , Atsushi Yoshizawa
- 申请人： Takashi Chuman , Yoshihiko Uchida , Hideo Satoh , Takuya Hata , Atsushi Yoshizawa
- 申请人地址： JP Tokyo
- 专利权人： Pioneer Corporation
- 当前专利权人： Pioneer Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2003-015935 20030124
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03C5/00
摘要：
A mask assembly includes a frame and at least one linear element secured onto the frame. The linear elements define a masking part. The masking part has at least one opening. The openings are made by removing predetermined linear elements from those secured to the frame.