发明授权
- 专利标题: Transistors and methods for making the same
- 专利标题(中): 晶体管及其制作方法
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申请号: US10859894申请日: 2004-06-03
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公开(公告)号: US07190047B2公开(公告)日: 2007-03-13
- 发明人: Young-Kai Chen , Vincent Etienne Houtsma , Nils Guenter Weimann
- 申请人: Young-Kai Chen , Vincent Etienne Houtsma , Nils Guenter Weimann
- 申请人地址: US NJ Murray Hill
- 专利权人: Lucent Technologies Inc.
- 当前专利权人: Lucent Technologies Inc.
- 当前专利权人地址: US NJ Murray Hill
- 主分类号: H01L27/082
- IPC分类号: H01L27/082
摘要:
Apparatus comprising: a first compound semiconductor composition layer doped to have a first charge carrier polarity; a second compound semiconductor composition layer doped to have a second charge carrier polarity and located on the first layer; a third compound semiconductor composition layer doped to have the first charge carrier polarity and located on the second layer; a base electrode on the second layer; and a spacer ring interposed between and defining a charge carrier access path distance between the base electrode and the third layer, the path distance being within a range of between about 200 Å and about 1000 Å. Techniques for making apparatus. Apparatus is useful as a heterobipolar transistor, particularly for high frequency applications.
公开/授权文献
- US20050269594A1 Transistors amd methods for making the same 公开/授权日:2005-12-08
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