Invention Grant
US07192530B2 Method of manufacturing distributed analog phase shifter using etched ferroelectric thin film 失效
使用蚀刻铁电薄膜制造分布式模拟移相器的方法

Method of manufacturing distributed analog phase shifter using etched ferroelectric thin film
Abstract:
Provided are a distributed analog phase shifter and a method of manufacturing the same, which reduce a change in a characteristic impedance while changing a phase velocity with respect to an applied voltage. In the distributed analog phase shifter, a coplanar waveguide (CPW) is formed in a line form on a substrate. A plurality of ferroelectric capacitors is periodically loaded to the CPW. The ferroelectric capacitors include a ferroelectric film in a pattern form and defines the ferroelectric film affected by the applied voltage within an area of the ferroelectric capacitors. Accordingly, the change in the phase velocity with respect to the applied voltage is maintained without the change of the CPW characteristic and a return loss characteristic and a total insertion loss are improved since a total dielectric loss of the ferroelectric film is decreased.
Information query
Patent Agency Ranking
0/0