Invention Grant
- Patent Title: Method of manufacturing distributed analog phase shifter using etched ferroelectric thin film
- Patent Title (中): 使用蚀刻铁电薄膜制造分布式模拟移相器的方法
-
Application No.: US10796628Application Date: 2004-03-08
-
Publication No.: US07192530B2Publication Date: 2007-03-20
- Inventor: Han Cheol Ryu , Seungeon Moon , Min Hwan Kwak , Su Jae Lee , Sang Seok Lee , Young Tae Kim
- Applicant: Han Cheol Ryu , Seungeon Moon , Min Hwan Kwak , Su Jae Lee , Sang Seok Lee , Young Tae Kim
- Applicant Address: KR
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR
- Agency: Blakely Sokoloff Taylor & Zafman
- Priority: KR10-2003-0056847 20030818
- Main IPC: H01P1/18
- IPC: H01P1/18

Abstract:
Provided are a distributed analog phase shifter and a method of manufacturing the same, which reduce a change in a characteristic impedance while changing a phase velocity with respect to an applied voltage. In the distributed analog phase shifter, a coplanar waveguide (CPW) is formed in a line form on a substrate. A plurality of ferroelectric capacitors is periodically loaded to the CPW. The ferroelectric capacitors include a ferroelectric film in a pattern form and defines the ferroelectric film affected by the applied voltage within an area of the ferroelectric capacitors. Accordingly, the change in the phase velocity with respect to the applied voltage is maintained without the change of the CPW characteristic and a return loss characteristic and a total insertion loss are improved since a total dielectric loss of the ferroelectric film is decreased.
Public/Granted literature
Information query