发明授权
US07192694B2 Photothermographic material 有权
光热成像材料

  • 专利标题: Photothermographic material
  • 专利标题(中): 光热成像材料
  • 申请号: US10702440
    申请日: 2003-11-07
  • 公开(公告)号: US07192694B2
    公开(公告)日: 2007-03-20
  • 发明人: Fumito Nariyuki
  • 申请人: Fumito Nariyuki
  • 申请人地址: JP Tokyo
  • 专利权人: Fujifilm Corporation
  • 当前专利权人: Fujifilm Corporation
  • 当前专利权人地址: JP Tokyo
  • 代理商 Margaret A. Burke; Sheldon J. Moss
  • 优先权: JP2002-327943 20021112
  • 主分类号: G03C5/16
  • IPC分类号: G03C5/16 G03C1/498
Photothermographic material
摘要:
A photothermographic material containing, on a substrate, at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder in which the total silver iodide content of the photosensitive silver halide is 40 mol % or more and 100 mol % or less, and the coating amount of the photosensitive silver halide, in terms of an amount of silver, is 0.0005 g/m2 or more and 0.4 g/m2 or less, as well as an image forming method for the photothermographic material which comprises exposing the photothermographic material by using a semiconductor laser having an emission peak intensity at a wavelength of from 350 nm to 450 nm as a light source.
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