发明授权
- 专利标题: Photothermographic material
- 专利标题(中): 光热成像材料
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申请号: US10702440申请日: 2003-11-07
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公开(公告)号: US07192694B2公开(公告)日: 2007-03-20
- 发明人: Fumito Nariyuki
- 申请人: Fumito Nariyuki
- 申请人地址: JP Tokyo
- 专利权人: Fujifilm Corporation
- 当前专利权人: Fujifilm Corporation
- 当前专利权人地址: JP Tokyo
- 代理商 Margaret A. Burke; Sheldon J. Moss
- 优先权: JP2002-327943 20021112
- 主分类号: G03C5/16
- IPC分类号: G03C5/16 ; G03C1/498
摘要:
A photothermographic material containing, on a substrate, at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder in which the total silver iodide content of the photosensitive silver halide is 40 mol % or more and 100 mol % or less, and the coating amount of the photosensitive silver halide, in terms of an amount of silver, is 0.0005 g/m2 or more and 0.4 g/m2 or less, as well as an image forming method for the photothermographic material which comprises exposing the photothermographic material by using a semiconductor laser having an emission peak intensity at a wavelength of from 350 nm to 450 nm as a light source.
公开/授权文献
- US20040096785A1 Photothermographic material 公开/授权日:2004-05-20
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