发明授权
- 专利标题： Method for manufacturing micro-structural unit
- 专利标题（中）： 微结构单元制造方法
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申请号： US11207871申请日： 2005-08-22
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公开(公告)号： US07192879B2公开(公告)日： 2007-03-20
- 发明人: Norinao Kouma , Osamu Tsuboi , Hisao Okuda , Hiromitsu Soneda , Mi Xiaoyu , Satoshi Ueda , Ippei Sawaki , Yoshitaka Nakamura
- 申请人： Norinao Kouma , Osamu Tsuboi , Hisao Okuda , Hiromitsu Soneda , Mi Xiaoyu , Satoshi Ueda , Ippei Sawaki , Yoshitaka Nakamura
- 申请人地址： JP Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JP Kawasaki
- 代理机构： Armstrong, Kratz, Quintos, Hanson & Brooks, LLP
- 优先权： JP2003-292555 20030812; JP2003-407838 20031205
- 主分类号： H01L21/302
- IPC分类号： H01L21/302
摘要：
A method for manufacturing a micro-structural unit is provided. By the method, micro-machining is performed on a material substrate including first through third conductive layers and two insulating layers, one of which is interposed between the first and the second conductive layers, and the other between the second and the third conductive layers. The method includes several etching steps performed on the layers of the material substrate that are different in thickness.
公开/授权文献
- US20050277217A1 Method for manufacturing micro-structural unit 公开/授权日：2005-12-15
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