发明授权
- 专利标题： System and method for design rule creation and selection
- 专利标题（中）： 设计规则创建和选择的系统和方法
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申请号： US10817132申请日： 2004-04-02
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公开(公告)号： US07194725B1公开(公告)日： 2007-03-20
- 发明人: Todd P. Lukanc , Cyrus E. Tabery , Luigi Capodieci , Carl Babcock , Hung-eil Kim , Christopher A. Spence , Chris Haidinyak
- 申请人： Todd P. Lukanc , Cyrus E. Tabery , Luigi Capodieci , Carl Babcock , Hung-eil Kim , Christopher A. Spence , Chris Haidinyak
- 申请人地址： US CA Sunnyvale
- 专利权人： Advanced Micro Devices, Inc.
- 当前专利权人： Advanced Micro Devices, Inc.
- 当前专利权人地址： US CA Sunnyvale
- 代理机构： Winstead Sechrest & Minick P.C.
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
A method of producing design rules including generating a plurality of parametrically varying geometric layouts and simulating how each geometric layout will pattern on a wafer. Edges of structures within the simulated geometric layouts can be classified based on manufacturability and design rules can be created to disallow layouts demonstrating poor manufacturability.