发明授权
- 专利标题: Method of producing silicon monocrystal
- 专利标题(中): 硅单晶的生产方法
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申请号: US10521035申请日: 2003-07-07
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公开(公告)号: US07195669B2公开(公告)日: 2007-03-27
- 发明人: Daisuke Wakabayashi , Masao Saito , Satoshi Sato , Jun Furukawa , Kounosuke Kitamura
- 申请人: Daisuke Wakabayashi , Masao Saito , Satoshi Sato , Jun Furukawa , Kounosuke Kitamura
- 申请人地址: JP Tokyo
- 专利权人: Sumitomo Mitsubishi Silicon Corporation
- 当前专利权人: Sumitomo Mitsubishi Silicon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Reed Smith LLP
- 优先权: JP2002-197140 20020705
- 国际申请: PCT/JP03/08577 WO 20030707
- 国际公布: WO2004/018742 WO 20040304
- 主分类号: C30B25/12
- IPC分类号: C30B25/12
摘要:
A silicon single crystal rod (24) is pulled from a silicon melt (13) made molten by a heater (17), and a change in diameter of the silicon single crystal rod every predetermined time is fed back to a pulling speed of the silicon single crystal rod and a temperature of the heater, thereby controlling a diameter of the silicon single crystal rod. A PID control in which a PID constant is changed on a plurality of stages is applied to a method which controls the pulling speed of the silicon single crystal rod so that the silicon single crystal rod has a target diameter and a method which controls a heater temperature so that the silicon single crystal rod has the target temperature. A set pulling speed for the silicon single crystal rod is set so that V/G becomes constant, and an actual pulling speed is accurately controlled so as to match with the set pulling speed, thereby suppressing a fluctuation in diameter of the single crystal rod.
公开/授权文献
- US20060130737A1 Method for manufacturing silicon single crystal 公开/授权日:2006-06-22
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