发明授权
- 专利标题： Continuous contour polishing of a multi-material surface
- 专利标题（中）： 多材料表面的连续轮廓抛光
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申请号： US10869605申请日： 2004-06-16
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公开(公告)号： US07198549B2公开(公告)日： 2007-04-03
- 发明人: J. Scott Steckenrider , Gary W. Snider
- 申请人： J. Scott Steckenrider , Gary W. Snider
- 申请人地址： US IL Aurora
- 专利权人： Cabot Microelectronics Corporation
- 当前专利权人： Cabot Microelectronics Corporation
- 当前专利权人地址： US IL Aurora
- 代理商 Thomas Omholt; John Gase
- 主分类号： B24B1/00
- IPC分类号： B24B1/00
摘要：
A chemical-mechanical polishing pad, and method of polishing a substrate using a polishing pad, comprising (a) a resilient subpad, and (b) a polymeric polishing film substantially coextensive with the resilient subpad, wherein the polymeric polishing film comprises (i) a polishing surface that is substantially free of bound abrasive particles, and (ii) a back surface releasably associated with the resilient subpad.
公开/授权文献
- US20050282470A1 Continuous contour polishing of a multi-material surface 公开/授权日：2005-12-22