发明授权
- 专利标题: Heat-sensitive lithographic printing plate precursor
- 专利标题(中): 热敏平版印刷版前体
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申请号: US10531627申请日: 2003-09-29
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公开(公告)号: US07198877B2公开(公告)日: 2007-04-03
- 发明人: Marc Van Damme , Johan Loccufier , Bert Groenendaal , Huub Van Aert
- 申请人: Marc Van Damme , Johan Loccufier , Bert Groenendaal , Huub Van Aert
- 申请人地址: BE Mortsel
- 专利权人: Agfa-Gevaert
- 当前专利权人: Agfa-Gevaert
- 当前专利权人地址: BE Mortsel
- 代理机构: Leydig, Voit & Mayer, Ltd.
- 优先权: EP02102446 20021015
- 国际申请: PCT/EP03/50664 WO 20030929
- 国际公布: WO2004/035310 WO 20040429
- 主分类号: G03F7/11
- IPC分类号: G03F7/11 ; G03F7/30
摘要:
A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a polymer, which comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group having the structure —N═N-Q wherein the —N═N— group is covalently bound to a carbon atom of the phenyl group and wherein Q is an aromatic group and wherein the substitution increases the chemical resistance of the coating.
公开/授权文献
- US20060019190A1 Heat-sensitive lithographic printing plate precursor 公开/授权日:2006-01-26
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