Invention Grant
- Patent Title: Plasma discharge method and plasma display using the same
- Patent Title (中): 等离子放电法和等离子显示器使用相同
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Application No.: US10942024Application Date: 2004-09-16
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Publication No.: US07199522B2Publication Date: 2007-04-03
- Inventor: Sang-Hun Jang , Hidekazu Hatanaka , Young-Mo Kim , Seong-Eui Lee , Xiaoqing Zeng , Kyung-Min Chung , Seung-Hyun Son , Gi-Young Kim , Hyoung-Bin Park
- Applicant: Sang-Hun Jang , Hidekazu Hatanaka , Young-Mo Kim , Seong-Eui Lee , Xiaoqing Zeng , Kyung-Min Chung , Seung-Hyun Son , Gi-Young Kim , Hyoung-Bin Park
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung SDI Co., Ltd.
- Current Assignee: Samsung SDI Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2003-0064566 20030917
- Main IPC: H01J17/49
- IPC: H01J17/49 ; G09G3/20
Abstract:
A plasma discharge method and a plasma display using the same. In the method, a sustain discharge uses a facing surfaces discharge and a surface discharge after an address discharge. The discharges occur in separate discharge areas, and priming particles generated by the discharges are exchanged. Thus, the stability and the efficiency of the sustain discharge increase, and a gap for the address discharge decreases to lower a breakdown voltage.
Public/Granted literature
- US20050067959A1 Plasma discharge method and plasma display using the same Public/Granted day:2005-03-31
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