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US07202167B2 Method of forming a diffusion barrier 有权
形成扩散阻挡层的方法

Method of forming a diffusion barrier
Abstract:
A barrier limits the diffusion of a metal, such as copper, into an insulating layer. The barrier may take the form of insulating layer made of a silicon carbide type material which has been exposed to ionised hydrogen subsequent to deposition. Preferably the material contains nitrogen and it is particularly preferred that the material has a dielectric constant of 3.5 or less.
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