Invention Grant
US07203264B2 High-stability shift circuit using amorphous silicon thin film transistors
有权
使用非晶硅薄膜晶体管的高稳定性移位电路
- Patent Title: High-stability shift circuit using amorphous silicon thin film transistors
- Patent Title (中): 使用非晶硅薄膜晶体管的高稳定性移位电路
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Application No.: US11167197Application Date: 2005-06-28
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Publication No.: US07203264B2Publication Date: 2007-04-10
- Inventor: Shin-Tai Lo , Yi-Chin Lin , Ruey-Shing Weng
- Applicant: Shin-Tai Lo , Yi-Chin Lin , Ruey-Shing Weng
- Applicant Address: TW Taichung
- Assignee: Wintek Corporation
- Current Assignee: Wintek Corporation
- Current Assignee Address: TW Taichung
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: G11C19/00
- IPC: G11C19/00

Abstract:
A high-stability shift circuit using amorphous silicon thin film transistors, which utilizes two out-of-phase pulses to control the operating mechanism and the bias-relations among transistors in the shift circuit. This makes the transistors under the driving conditions of positive/negative-alternating biases so as to restrain the voltage shift of the transistors such that the threshold voltage will not excessively increase along with the increasing operating time. This can not only increase the lifetime of the amorphous silicon thin film transistors but also extend the operating time of the shift circuit.
Public/Granted literature
- US20060291610A1 High-stability shift circuit using amorphous silicon thin film transistors Public/Granted day:2006-12-28
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