发明授权
- 专利标题： Pattern defect inspection method and its apparatus
- 专利标题（中）： 图案缺陷检查方法及其装置
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申请号： US10765920申请日： 2004-01-29
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公开(公告)号： US07205549B2公开(公告)日： 2007-04-17
- 发明人: Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
- 申请人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
- 申请人地址： JP Tokyo
- 专利权人： Hitachi High-Technologies Corporation
- 当前专利权人： Hitachi High-Technologies Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Antonelli, Terry, Stout & Kraus, LLP.
- 优先权： JP2003-020896 20030129
- 主分类号： G01J1/42
- IPC分类号： G01J1/42
摘要：
The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.
公开/授权文献
- US20040262529A1 Pattern defect inspection method and its apparatus 公开/授权日：2004-12-30
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