发明授权
- 专利标题: Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results
- 专利标题(中): 计量配方生成方法和系统,设计,模拟和计量结果的审查和分析
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申请号: US10865047申请日: 2004-06-10
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公开(公告)号: US07207017B1公开(公告)日: 2007-04-17
- 发明人: Cyrus Tabery , Chris Haidinyak , Todd P. Lukanc , Luigi Capodieci , Carl P. Babcock , Hung-eil Kim , Christopher A. Spence
- 申请人: Cyrus Tabery , Chris Haidinyak , Todd P. Lukanc , Luigi Capodieci , Carl P. Babcock , Hung-eil Kim , Christopher A. Spence
- 申请人地址: US CA Sunnyvale
- 专利权人: Advanced Micro Devices, Inc.
- 当前专利权人: Advanced Micro Devices, Inc.
- 当前专利权人地址: US CA Sunnyvale
- 代理机构: Renner, Otto, Boisselle and Sklar, LLP
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A method of generating a metrology recipe includes identifying regions of interest within a device layout. A coordinate list, which corresponds to the identified regions of interest, can be provided and used to create a clipped layout, which can be represented by a clipped layout data file. The clipped layout data file and corresponding coordinate list can be provided and converted into a metrology recipe for guiding one or more metrology instruments in testing a processed wafer and/or reticle. The experimental metrology results received in response to the metrology request can be linked to corresponding design data and simulation data and stored in a queriable database system.