发明授权
- 专利标题: Malonic acid monomethyl derivatives and production process thereof
- 专利标题(中): 丙二酸单甲基衍生物及其制备方法
-
申请号: US11486116申请日: 2006-07-14
-
公开(公告)号: US07208621B2公开(公告)日: 2007-04-24
- 发明人: Satoru Nose , Kieko Sano , Takeshi Hamatani
- 申请人: Satoru Nose , Kieko Sano , Takeshi Hamatani
- 申请人地址: JP Osaka
- 专利权人: Daicel Chemical Industries, Ltd.
- 当前专利权人: Daicel Chemical Industries, Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2003-409350 20031208
- 主分类号: C07C69/76
- IPC分类号: C07C69/76
摘要:
A novel monomethyl malonate derivative is represented by following Formula (I): wherein X is a halogen atom; and Me is methyl group. This compound can be prepared by the steps of (A) reacting a benzyl halide derivative represented by following Formula (II): wherein X and Y may be the same as or different from each other and are each a halogen atom, with dimethyl malonate in the presence of a base to yield a dimethyl malonate derivative represented by following Formula (III): wherein X and Me have the same meanings as defined above; and (B) hydrolyzing the dimethyl malonate derivative of Formula (III). The compound is useful in the production of an indanonecarboxylic acid ester having a halogen atom on the indanone ring.
公开/授权文献
信息查询