发明授权
- 专利标题： Resist pattern forming method, magnetic recording medium manufacturing method and magnetic head manufacturing method
- 专利标题（中）： 抗蚀剂图案形成方法，磁记录介质制造方法和磁头制造方法
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申请号： US10982824申请日： 2004-11-08
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公开(公告)号： US07214624B2公开(公告)日： 2007-05-08
- 发明人: Minoru Fujita , Mitsuru Takai
- 申请人： Minoru Fujita , Mitsuru Takai
- 申请人地址： JP Tokyo
- 专利权人： TDK Corporation
- 当前专利权人： TDK Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Kenyon & Kenyon LLP
- 优先权： JPP2003-384694 20031114
- 主分类号： H01L21/302
- IPC分类号： H01L21/302
摘要：
A mold having a pattern of a concavo-convex surface including protrusion and recess is prepared and the pattern is transferred to a resist layer formed on a substrate by an imprinting method. The side surface of a protrusion of the transferred resist pattern is then etched so that the protrusion has a width narrower than a width of the corresponding recess formed to the mold. This resist pattern forming method is preferably applicable to a magnetic recording medium manufacturing method and a magnetic head manufacturing method.
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