发明授权
- 专利标题: Ferroelectric memory device
- 专利标题(中): 铁电存储器件
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申请号: US11216078申请日: 2005-09-01
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公开(公告)号: US07215567B2公开(公告)日: 2007-05-08
- 发明人: Masami Hashimoto , Takeshi Kijima , Junichi Karasawa , Mayumi Ueno
- 申请人: Masami Hashimoto , Takeshi Kijima , Junichi Karasawa , Mayumi Ueno
- 申请人地址: JP Tokyo
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2004-269144 20040916
- 主分类号: G11C11/22
- IPC分类号: G11C11/22
摘要:
To provide a nondestructive-read ferroelectric memory capable of realizing high speed, high integration, and long service life.The present invention is provided with an MFSFET 100 having a ferroelectric thin film at its gate portion, word line 104, bit line 105, and bit line 106 so as to apply voltage equal to or higher than the coercive electric field of the ferroelectric thin film between the bit line 105 and the word line 104 at first write timing and apply voltage equal to or higher than the coercive electric field between the bit line 106 and the word line 104 at second write timing, and applies voltage equal to or lower than the coercive electric field of the ferroelectric thin film between the bit line 105 and the word line 104 at first read timing to detect the current flowing between the both bit lines, and applies voltage equal to or lower than the coercive electric field between the bit line 106 and the word line 104 at second read timing to detect the current flowing between the both bit lines.
公开/授权文献
- US20060056225A1 Ferroelectric memory device 公开/授权日:2006-03-16
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