发明授权
- 专利标题: Trap apparatus
- 专利标题(中): 陷阱装置
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申请号: US10839288申请日: 2004-05-06
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公开(公告)号: US07217306B2公开(公告)日: 2007-05-15
- 发明人: Norihiko Nomura , Nobuharu Noji , Kiyoshi Yanagisawa
- 申请人: Norihiko Nomura , Nobuharu Noji , Kiyoshi Yanagisawa
- 申请人地址: JP Tokyo
- 专利权人: Ebara Corporation
- 当前专利权人: Ebara Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2000-345139 20001113; JP2001-8325 20010116
- 主分类号: B01D45/00
- IPC分类号: B01D45/00
摘要:
A continuous processing trap apparatus is capable of increasing the trapping efficiency while maintaining conductance required by a vacuum chamber. The trap apparatus includes an exhaust passage for evacuating a hermetically sealed chamber by a vacuum pump, a hermetically sealed trapping and regenerating casing extending across the exhaust passage and a regenerating passage adjacent to the exhaust passage, and a trap unit movably housed in the trapping and regenerating casing for selective movement between a trapping position connected to the exhaust passage and a regenerating position connected to the regenerating passage. The trap apparatus further includes valve bodies disposed one on each side of the trap unit and supporting seals on outer circumferential surfaces thereof for sealing the exhaust passage and the regenerating passage from each other, and a monitoring mechanism for monitoring whether the seals are functioning normally.
公开/授权文献
- US20040200214A1 Trap apparatus 公开/授权日:2004-10-14
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