发明授权
US07224438B2 Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus
有权
制造装置的方法，由此制造的装置，计算机程序和光刻装置
- 专利标题： Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus
- 专利标题（中）： 制造装置的方法，由此制造的装置，计算机程序和光刻装置
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申请号： US10738980申请日： 2003-12-19
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公开(公告)号： US07224438B2公开(公告)日： 2007-05-29
- 发明人: Joost Jeroen Ottens , Marcel Nicolaas Jacobus Van Kervinck
- 申请人： Joost Jeroen Ottens , Marcel Nicolaas Jacobus Van Kervinck
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP02080451 20021219
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G03B27/42
摘要：
During scanned exposure of target portions at the edge of the substrate, the position of an edge of the illumination field is changed so as to prevent or reduce radiation falling onto the substrate table or to expose an L-shaped area. In this way the heat load on the substrate table can be reduced and dummy structures can fill a mouse bite without overlapping an alignment mark.