Invention Grant
- Patent Title: Surface treatment agent for copper and copper alloy
- Patent Title (中): 铜和铜合金表面处理剂
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Application No.: US10481018Application Date: 2002-06-18
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Publication No.: US07232528B2Publication Date: 2007-06-19
- Inventor: Akira Hosomi , Naoki Kogure , Kenichi Moriyama , Kenichi Takahashi , Atsushi Hosoda , Kazuhiko Ikeda
- Applicant: Akira Hosomi , Naoki Kogure , Kenichi Moriyama , Kenichi Takahashi , Atsushi Hosoda , Kazuhiko Ikeda
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2001-190660 20010625
- International Application: PCT/JP02/06061 WO 20020618
- International Announcement: WO03/000954 WO 20030103
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
The surface treatment agent for copper and copper alloys contains hydrogen peroxide, a mineral acid, an azole compound, silver ion and a halide ion. The surface treatment agent for copper and copper alloys is useful in the production of printed wiring boards in electronics industry. The surface treatment agent roughens the surface of copper and copper alloys. Particularly, the surface treatment agent can form a uniform and undulation-free roughened surface on copper-clad substrates having plated mirror surface, this having been difficult in conventional techniques, thereby significantly improving the adhesion to etching resists, solder resists, in addition, to prepregs and a resin for mounting electronic parts.
Public/Granted literature
- US20050061202A1 Surface treatment agent for copper and copper alloy Public/Granted day:2005-03-24
Information query
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