发明授权
- 专利标题: Support for lithographic printing plate and presensitized plate
- 专利标题(中): 支持平版印刷版和预印版
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申请号: US10784879申请日: 2004-02-24
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公开(公告)号: US07232645B2公开(公告)日: 2007-06-19
- 发明人: Hirokazu Sawada , Akio Uesugi
- 申请人: Hirokazu Sawada , Akio Uesugi
- 申请人地址: JP Tokyo
- 专利权人: Fujifilm Corporation
- 当前专利权人: Fujifilm Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2003-047324 20030225
- 主分类号: G03F7/09
- IPC分类号: G03F7/09
摘要:
The support for a lithographic printing plate obtained by performing graining treatment including electrochemical graining treatment on an aluminum plate, the aluminum plate is an aluminum plate which contains Fe of 0.02 to 0.29 wt %, Si of 0.03 to 0.15 wt %, Cu of 0.020 to 0.040 wt % and Ti of 0.050 wt % or less and whose remaining portion is composed of Al and unavoidable impurities. In addition, the support for a lithographic printing plate where surface area ratio and steepness obtained from three-dimensional data found with an atomic force microscope (AFM) each satisfies the specified conditions is excellent in printing performance (press life, scum resistance, sensitivity and cleaner press life or the like) and handling property (scratch resistance, fatigue fracture strength or the like) when the lithographic printing plate is prepared.
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