发明授权
US07232769B2 Method of forming amorphous silica-based coating film with low dielectric constant and thus obtained silica-based coating film
有权
形成具有低介电常数的无定形二氧化硅基涂膜的方法，由此得到二氧化硅基涂膜
- 专利标题： Method of forming amorphous silica-based coating film with low dielectric constant and thus obtained silica-based coating film
- 专利标题（中）： 形成具有低介电常数的无定形二氧化硅基涂膜的方法，由此得到二氧化硅基涂膜
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申请号： US10533238申请日： 2003-10-27
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公开(公告)号： US07232769B2公开(公告)日： 2007-06-19
- 发明人: Akira Nakashima , Miki Egami , Michio Komatsu , Yoshihiro Nakata , Ei Yano , Katsumi Suzuki
- 申请人： Akira Nakashima , Miki Egami , Michio Komatsu , Yoshihiro Nakata , Ei Yano , Katsumi Suzuki
- 申请人地址： JP Kawassaki-shi, Kanagawa JP Kawasaki-shi, Kanagawa
- 专利权人： Catalysts & Chemicals Industries Co., Ltd.,Fujitsu Limited
- 当前专利权人： Catalysts & Chemicals Industries Co., Ltd.,Fujitsu Limited
- 当前专利权人地址： JP Kawassaki-shi, Kanagawa JP Kawasaki-shi, Kanagawa
- 代理商 Manabu Kanesaka
- 优先权： JP2002-318418 20021031
- 国际申请： PCT/JP03/13691 WO 20031027
- 国际公布： WO2004/040635 WO 20040513
- 主分类号： H01L21/30
- IPC分类号： H01L21/30
摘要：
The present invention relates to an amorphous silica-based coating film with a low specific dielectric constant of 2.5 or below and the Young's modulus of 6.0 GPa or more and having excellent hydrophobic property, and to a method of forming the same. A liquid composition containing a silicon compound obtained by hydrolyzing tetraalkyl ortho silicate (TAOS) and specific alkoxysilane (AS) in the presence of tetraalkyl ammonium hydroxide (TAAOH) is prepared. The liquid composition is then applied on a substrate, heated and cured to obtain a coating film. The coating film obtained as described has a smooth surface and also has specific micropores therein.
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