发明授权
- 专利标题： Polishing pad and method of producing same
- 专利标题（中）： 抛光垫及其制造方法
-
申请号： US11010199申请日： 2004-12-10
-
公开(公告)号： US07238097B2公开(公告)日： 2007-07-03
- 发明人: Hisatomo Ohno , Toshihiro Izumi , Mitsuru Saito , Takuya Nagamine , Claughton Miller , Ichiro Kodaka
- 申请人： Hisatomo Ohno , Toshihiro Izumi , Mitsuru Saito , Takuya Nagamine , Claughton Miller , Ichiro Kodaka
- 申请人地址： JP Tokyo
- 专利权人： NIHON Microcoating Co., Ltd.
- 当前专利权人： NIHON Microcoating Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Beyer Weaver & Thomas LLP
- 优先权： JP2003-107863 20030411; JPPCT/Jp04/05078 20040408
- 主分类号： B24D11/00
- IPC分类号： B24D11/00
摘要：
A transparent pad having a polishing surface with an average surface roughness of 5 μm or less is used as a polishing pad. An indentation is formed on the back surface of the transparent pad such that its rate of light transmission is locally changed. The transparent pad has a rate of light transmission equal to or greater than 10% or preferably 30% for light of at least one wavelength in the range of 350 nm–900 nm.
公开/授权文献
- US20050142996A1 Polishing pad and method of producing same 公开/授权日：2005-06-30
信息查询
