发明授权
US07245802B2 Beam homogenizer, laser irradiation apparatus and method for manufacturing semiconductor device
有权
光束均化器,激光照射装置以及半导体装置的制造方法
- 专利标题: Beam homogenizer, laser irradiation apparatus and method for manufacturing semiconductor device
- 专利标题(中): 光束均化器,激光照射装置以及半导体装置的制造方法
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申请号: US10885635申请日: 2004-07-08
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公开(公告)号: US07245802B2公开(公告)日: 2007-07-17
- 发明人: Koichiro Tanaka
- 申请人: Koichiro Tanaka
- 申请人地址: JP Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Kanagawa-ken
- 代理机构: Robinson Intellectual Property Law Office, P.C.
- 代理商 Eric J. Robinson
- 优先权: JP2003-286304 20030804
- 主分类号: G02B6/26
- IPC分类号: G02B6/26 ; G02B6/00
摘要:
A cylindrical lens array cannot be manufactured so that each cylindrical lens has the same radius of curvature and the same accuracy in the surface. Therefore, when the laser annealing is performed using the cylindrical lens array, the beam spots divided by the cylindrical lens array cannot be superposed completely in the same surface. As a result, there is a region where the energy is attenuated in the edge portion of the rectangular beam to be formed, and therefore the intensity distribution of the laser beam becomes inhomogeneous. In the present invention, the cylindrical lens array is used in combination with the optical waveguide. After dividing the laser beam in a predetermined direction by the cylindrical lens array, the divided beams are combined, and then the laser beam is incident into the optical waveguide that acts upon the same direction as the predetermined direction. This can correct the variation in the intensity of the laser beam due to the processing inaccuracy of the cylindrical lens array.
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