发明授权
- 专利标题: Monitoring of cleaning process
- 专利标题(中): 清洁过程监控
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申请号: US10326041申请日: 2002-12-20
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公开(公告)号: US07246627B2公开(公告)日: 2007-07-24
- 发明人: Paul T. Jacobs , Jenn-Hann Wang , Szu-Min Lin
- 申请人: Paul T. Jacobs , Jenn-Hann Wang , Szu-Min Lin
- 申请人地址: US NJ Somerville
- 专利权人: Ethicon, Inc.
- 当前专利权人: Ethicon, Inc.
- 当前专利权人地址: US NJ Somerville
- 主分类号: B08B3/02
- IPC分类号: B08B3/02
摘要:
An apparatus for monitoring a cleaning process for a medical device includes a cleaning chamber for receiving and cleaning the instrument with a cleaning liquid, a receiving well within the cleaning chamber, a removable soil standard receivable within the receiving well whereby to be exposed to the cleaning process within the cleaning chamber; and a soil detector coupled to the cleaning chamber and adapted to provide an indication of the amount of the soil on the soil standard while the soil standard is received within the receiving well.
公开/授权文献
- US20030164182A1 Monitoring of cleaning process 公开/授权日:2003-09-04
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