发明授权
- 专利标题: Method for producing magnetic memory device
- 专利标题(中): 磁存储器件的制造方法
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申请号: US11389281申请日: 2006-03-27
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公开(公告)号: US07247506B2公开(公告)日: 2007-07-24
- 发明人: Minoru Amano , Tatsuya Kishi , Yoshiaki Saito , Tomomasa Ueda , Hiroaki Yoda
- 申请人: Minoru Amano , Tatsuya Kishi , Yoshiaki Saito , Tomomasa Ueda , Hiroaki Yoda
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2002-97207 20020329
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
There is provided a magnetic memory device which has a small switching current for a writing line and which has a small variation therein. A method for producing such a magnetic memory device includes: forming a magnetoresistive effect element; forming a first insulating film so as to cover the magnetoresistive effect element; forming a coating film so as to cover the first insulating film; exposing a top face of the magnetoresistive effect element; forming an upper writing line on the magnetoresistive effect element; exposing the first insulating film on a side portion of the magnetoresistive effect element by removing a part or all of the coating film; and forming a yoke structural member so as to cover at least a side portion of the upper writing line and so as to contact the exposed first insulating film on the side portion of the magnetoresistive effect element.
公开/授权文献
- US20060163196A1 Method for producing magnetic memory device 公开/授权日:2006-07-27
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