发明授权
- 专利标题: Full swath analysis
- 专利标题(中): 全幅分析
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申请号: US11314627申请日: 2005-12-21
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公开(公告)号: US07251586B2公开(公告)日: 2007-07-31
- 发明人: Krishnamurthy Bhaskar , Mark J. Roulo , John S. Taylor , Lawrence R. Miller , Paul T. Russell , Jason Z. Lin , Eliezer Rosengaus , Richard M. Wallingford , Kishore Bubna
- 申请人: Krishnamurthy Bhaskar , Mark J. Roulo , John S. Taylor , Lawrence R. Miller , Paul T. Russell , Jason Z. Lin , Eliezer Rosengaus , Richard M. Wallingford , Kishore Bubna
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Technologies Corporation
- 当前专利权人: KLA-Tencor Technologies Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Luedeka, Neely & Graham, P.C.
- 主分类号: G21C17/00
- IPC分类号: G21C17/00 ; G06F11/30 ; G06F15/00
摘要:
An inspection system for detecting anomalies on a substrate. A first network is coupled to the sensor array and communicates image data. Process nodes are couple to the first network, and process the data to produce reports. Each process node has an interface card that formats the data for a high speed interface bus that is coupled to the interface card. A computer receives and processes the data to produce the report. A second network receives the reports from the process nodes. A job manager is coupled to the second network, and receives the reports from the process nodes and sends information to the process nodes to coordinate the processing of the data in the process nodes.
公开/授权文献
- US20060106580A1 Full swath analysis 公开/授权日:2006-05-18