发明授权
- 专利标题： Method for constructing a layer structure on a substrate
- 专利标题（中）： 在基板上构造层结构的方法
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申请号： US10322762申请日： 2002-12-19
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公开(公告)号： US07253355B2公开(公告)日： 2007-08-07
- 发明人: Ingo Schwirtlich , Wilfried Schmidt , Hilmar von Campe
- 申请人： Ingo Schwirtlich , Wilfried Schmidt , Hilmar von Campe
- 申请人地址： DE Alzenau
- 专利权人： RWE Schott Solar GmbH
- 当前专利权人： RWE Schott Solar GmbH
- 当前专利权人地址： DE Alzenau
- 代理机构： Dennison, Schultz & MacDonald
- 优先权： DE10163100 20011220; EP02003042 20020212
- 主分类号： H01L31/0216
- IPC分类号： H01L31/0216 ; B05D3/02
摘要：
The invention relates to a method for constructing a layer structure on an especially fragile flat substrate. In order for thin, fragile flat substrates to be able to be subjected to refinement or construction of semiconductor components, a process is proposed with the steps: Applying an inorganic ceramic phase to the fragile substrate and subsequent heat treatment for hardening and sintering the inorganic ceramic material.
公开/授权文献
- US20030121545A1 Method for constructing a layer structure on a substrate 公开/授权日：2003-07-03