发明授权
- 专利标题： Mask, substrate with light reflective film, method for manufacturing light reflective film, liquid crystal display device, and electronic apparatus
- 专利标题（中）： 掩模，具有光反射膜的基板，制造光反射膜的方法，液晶显示装置和电子设备
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申请号： US11368196申请日： 2006-03-03
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公开(公告)号： US07255981B2公开(公告)日： 2007-08-14
- 发明人: Toshihiro Otake , Mutsumi Matsuo , Tadashi Tsuyuki
- 申请人： Toshihiro Otake , Mutsumi Matsuo , Tadashi Tsuyuki
- 申请人地址： JP
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP
- 代理机构： Harness, Dickey & Pierce, P.L.C.
- 优先权： JP2002-108529 20020410
- 主分类号： G02F1/1335
- IPC分类号： G02F1/1335
摘要：
A substrate is provided with a light reflective film including a base and a reflective layer, in which a plurality of concave portions or convex portions formed on the surface of the base are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or a whole screen unit, are formed using a mask in which light transmissive or non-transmissive portions are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or the whole screen unit.