Invention Grant
- Patent Title: Device for homogeneous distribution of a fluid in a chamber and uses thereof
- Patent Title (中): 流体在室中均匀分布的装置及其用途
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Application No.: US10476535Application Date: 2002-04-19
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Publication No.: US07258144B2Publication Date: 2007-08-21
- Inventor: Daniel Barthod , Denis Vedrine , Pedro Nascimento
- Applicant: Daniel Barthod , Denis Vedrine , Pedro Nascimento
- Applicant Address: FR Puteaux
- Assignee: Total Fina Elf France
- Current Assignee: Total Fina Elf France
- Current Assignee Address: FR Puteaux
- Agency: Sughrue Mion, PLLC
- Priority: FR0105981 20010504
- International Application: PCT/FR02/01348 WO 20020419
- International Announcement: WO02/089969 WO 20021114
- Main IPC: B65B1/04
- IPC: B65B1/04

Abstract:
The invention concerns a device wherein the diffusion chamber (6) comprises, between its upstream end and its downstream end, in the direction of the fluid flow, at least an insert (12) formed by an annular ring having an external diameter identical to the internal diameter of the chamber, said annular ring being arranged perpendicular to the axis of the supply conduit and projecting towards the inside part of the chamber from the side wall(s) thereof, to form a lateral obstacle to the fluid flow, the solid surface of the insert (12) being sufficient to generate in the upstream part of the chamber a pressure higher than that of the downstream part.
Public/Granted literature
- US20050011972A1 Device for homogeneous distribution of a fluid in a chamber and uses thereof Public/Granted day:2005-01-20
Information query
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