Invention Grant
- Patent Title: Apparatus and method for controlled particle beam manufacturing
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Application No.: US11484015Application Date: 2006-07-10
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Publication No.: US07259373B2Publication Date: 2007-08-21
- Inventor: Michael John Zani , Mark Joseph Bennahmias , Mark Anthony Mayse , Jeffrey Winfield Scott
- Applicant: Michael John Zani , Mark Joseph Bennahmias , Mark Anthony Mayse , Jeffrey Winfield Scott
- Applicant Address: US CA Laguna Niguel
- Assignee: NexGenSemi Holdings Corporation
- Current Assignee: NexGenSemi Holdings Corporation
- Current Assignee Address: US CA Laguna Niguel
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Main IPC: G21K7/00
- IPC: G21K7/00

Abstract:
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
Public/Granted literature
- US20070045534A1 Apparatus and method for controlled particle beam manufacturing Public/Granted day:2007-03-01
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