Invention Grant
- Patent Title: Apparatus and method for inspecting pattern
- Patent Title (中): 用于检查图案的装置和方法
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Application No.: US10434105Application Date: 2003-05-09
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Publication No.: US07266232B2Publication Date: 2007-09-04
- Inventor: Hiroshi Asai , Yuichiro Hikida , Hiroyuki Onishi
- Applicant: Hiroshi Asai , Yuichiro Hikida , Hiroyuki Onishi
- Applicant Address: JP Kyoto
- Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: McDermott Will & Emery LLP
- Priority: JPP2002-168054 20020610
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
An inspection apparatus (1) has an image pickup part (2) for performing an image pickup of a substrate (9), an operation part (4) to which an image signal is inputted from said image pickup part (2) and a computer (5), and the operation part (4) specifies an inspection image and a reference image from an object image acquired by the image pickup part (2). In the operation part (4), a region class to which each pixel of the specified inspection image belongs is specified on the basis of a corresponding pixel value of the reference image. In a comparator circuit of the operation part (4), a differential absolute value between each pixel of the inspection image and a corresponding pixel of the reference image is calculated and the differential absolute value is compared with a defect check threshold value in accordance with the specified region class, to perform defect check. The inspection apparatus (1) can thereby appropriately detect a defect in accordance with the region class to which each pixel belongs.
Public/Granted literature
- US20030228045A1 Apparatus and method for inspecting pattern Public/Granted day:2003-12-11
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