发明授权
- 专利标题: Apparatus and method for inspecting pattern
- 专利标题(中): 用于检查图案的装置和方法
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申请号: US10434105申请日: 2003-05-09
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公开(公告)号: US07266232B2公开(公告)日: 2007-09-04
- 发明人: Hiroshi Asai , Yuichiro Hikida , Hiroyuki Onishi
- 申请人: Hiroshi Asai , Yuichiro Hikida , Hiroyuki Onishi
- 申请人地址: JP Kyoto
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JP Kyoto
- 代理机构: McDermott Will & Emery LLP
- 优先权: JPP2002-168054 20020610
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
An inspection apparatus (1) has an image pickup part (2) for performing an image pickup of a substrate (9), an operation part (4) to which an image signal is inputted from said image pickup part (2) and a computer (5), and the operation part (4) specifies an inspection image and a reference image from an object image acquired by the image pickup part (2). In the operation part (4), a region class to which each pixel of the specified inspection image belongs is specified on the basis of a corresponding pixel value of the reference image. In a comparator circuit of the operation part (4), a differential absolute value between each pixel of the inspection image and a corresponding pixel of the reference image is calculated and the differential absolute value is compared with a defect check threshold value in accordance with the specified region class, to perform defect check. The inspection apparatus (1) can thereby appropriately detect a defect in accordance with the region class to which each pixel belongs.
公开/授权文献
- US20030228045A1 Apparatus and method for inspecting pattern 公开/授权日:2003-12-11
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