Invention Grant
- Patent Title: Vertical GaN light emitting diode and method for manufacturing the same
- Patent Title (中): 垂直GaN发光二极管及其制造方法
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Application No.: US10601597Application Date: 2003-06-24
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Publication No.: US07268372B2Publication Date: 2007-09-11
- Inventor: Young Ho Park , Hun Joo Hahm , J ong Seok Na , Seung Jin Yoo
- Applicant: Young Ho Park , Hun Joo Hahm , J ong Seok Na , Seung Jin Yoo
- Applicant Address: KR Kyungki-Do
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Kyungki-Do
- Agency: Lowe Hauptman Ham & Berner
- Priority: KR10-2002-0084703 20021227
- Main IPC: H01L29/24
- IPC: H01L29/24 ; H01L33/00

Abstract:
Disclosed are a vertical GaN light emitting diode and a method for manufacturing the same. The vertical GaN light emitting diode comprises a first conductive GaN clad layer with an upper surface provided with a first contact formed thereon, an active layer formed on a lower surface of the first conductive GaN clad layer, a second conductive GaN clad layer formed on a lower surface of the active layer, a conductive adhesive layer formed on the second conductive GaN clad layer, and a conductive substrate, with a lower surface provided with a second contact formed thereon, formed on a lower surface of the conductive adhesive layer. The method for manufacturing the vertical GaN light emitting diodes comprises the step of removing the sapphire substrate from the light emitting structure so as to prevent the damages on a GaN single crystal plane of the structure.
Public/Granted literature
- US20050173692A1 Vertical GaN light emitting diode and method for manufacturing the same Public/Granted day:2005-08-11
Information query
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